Infrastructure Facilities
Facilities Available
Crystal Growth Facility
Czochralski Ge Puller, II-VI Materials ( Bridgeman Growth), GaAs Crystal & Substrates
Epitaxial Growth Facility
III-N & III-As MOVPE; LPE Growth Facility; II-VI, III-N, III-As, & III-Sb MBE
Central Characterization Facility
HRXRD, XPS, SIMS, FESEM, SPM with AFM, STM, etc., RAMAN & µ-PL System, FTIR & UV-VIS-NIR Spectrophotometers, 1.2 K & 8 Tesla Hall Measurement System
Nano-Fabrication Facility
LPCVD Growth of CNT & Graphene, , FIB, ALD, and Dip Pen Nanolithographer
Semiconductor Processing Facility
Class 100 Clean Room Area, Electron Beam Writing Tool, Laser Pattern Generator, Mask Aligner, Reactive Ion Etching, Cr Etch Wet Station, Plasma Asher, SRDE, Developer Wet Station
Test & Measurement Facility
FPA Tester, Low Temperature (77 K) Four Probe Electrical Testing Cryostation, Manual Load Pull Measurement Setup, RF Measurement Setup